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《Contact lens & anterior eye》2021,44(6):101388
PurposeTo investigate the relationship between the real contact lens imprint into the conjunctival tissue, observed by optical coherence tomography (OCT) and conjunctival staining and contact lens wearing comfort.Methods17 participants (mean age = 26.6 SD ± 3.6 years; 7 females) were fitted with three different contact lenses base curves of the same silicone hydrogel custom lens type (Visell 50; Hecht Contactlinsen, Au, Germany) in a randomised order. One lens was optimally fitted according to the manufacturer's recommendation, one fitted 0.4 mm flatter and one fitted 0.4 mm steeper. After 4 h of lens wear the contact lens edge in the area of the conjunctiva was imaged nasally and temporally using OCT (Optovue iVue SD-OCT). To correct the artefact due to optical distortion with OCT, the imprint of all worn lenses was measured on a glass plate afterwards. Conjunctival staining in the limbal region after 4 h of lens wear was classified using the CCLRU Grading Scale. Comfort scoring was based on visual analog scales from 0 (very poor) to 100 (excellent).ResultsThe mean conjunctival imprint of all contact lens edges was 32.0 ± 8.1 μm before and 7.3 ± 6.5 μm after distortion correction of the OCT images. The distortion corrected conjunctival imprint with the 0.4 mm steeper lens (11.5 ± 6.2 μm) was statistically significantly greater compared to the optimally fitted lens (6.5 ± 5.9 μm) (One-way ANOVA followed Tukey-test; p = 0.017) and greater compared to the 0.4 mm flatter lens (3.9 ± 5.3 μm) (p < 0.001). There was no statistically significant difference between the optimally fitted lens and the 0.4 mm flatter lens (p = 0.209). The nasally measured imprint (11.4 ± 9.0 μm) was significantly greater than the temporally measured (3.3 ± 7.6 μm) (p < 0.001). There was no statistically significant correlation between the amount of conjunctival imprint and the graded conjunctival staining (p = 0.346) or the wearer’s comfort (p = 0.735).ConclusionsContact lens edges imaged by OCT exhibited displacement artefacts. The observed conjunctival imprints are a combination of real conjunctival compression and artefacts. A deeper imprint of the contact lens into the conjunctiva caused by a steeper base curve was not related to clinically significant staining or changes in comfort after 4 h of lens wear. The observed differences between nasal and temporal imprint are likely to be caused by variations of conjunctival thickness and the shape of the underlying sclera. 相似文献
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1 Introduction High power laser diode arrays (LDA) have many advan- tages such as small volume, long working life, high slope efficiency and high optical density, so they have many applications in medical treatment, material pro- cessing, and for the pumping source of solid laser and etc. But unfortunately, the LDA can not be easy to use directly in these fields because of their poor beam quality and extremely asymmetric divergent beams (!x≈ 5°~10°and !y≈20°~35°, for example), so it … 相似文献
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通过对三重四极透镜成像系统的渐晕模拟,研究了并行电子能量损失谱仪中物方视场、漂移管径以及与电荷耦合探测器(CCD)幅面尺寸的对应关系,并由它们间的相互关系确定了与CCD幅面二维探测器尺寸相匹配的漂移管径。 相似文献
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在某砌石双曲拱坝施工中,由于施工放样的错误,使已建拱坝坝轴线偏离了设计坝轴线,为此需要重新调整拱坝体型。根据已建成的拱冠梁上游面曲线重新确定新的曲线方程,待建部分用新的曲线方程延伸,经空间有限元的应力变形分析,认为调整后的拱坝体型可行。现已付予实施。 相似文献
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V. Anjos M.J.V. Bell E.F. da Silva Jr. R.W.A. Franco I.A. Esquef 《Microelectronics Journal》2005,36(11):977-980
In this paper we report the use of photothermal techniques such as Thermal lens (TL) spectrometry, Photoacoustic and heat capacity, ρcp, to determine the thermo-optical parameters, such as thermal conductivity (K), thermal diffusivity (D), specific heat (cp) and the optical path dependence with temperature (ds/dT), of an undoped polycrystalline 3C-SiC. To our knowledge, this is the first time that Thermal lens technique is used for wide band-gap systems. Results obtained for the polycrystalline sample with TL technique indicates that ds/dT is negative at room temperature. Moreover, the obtained values of thermal diffusivity and thermal conductivity are in good agreement with that found in the literature, indicating that the phototermal techniques can be used to obtain the referred parameters in circumstances where other techniques cannot be used, for example, in harsh environments. 相似文献
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浸没式光刻技术的研究进展 总被引:6,自引:1,他引:5
浸没式光刻技术是将某种液体充满投影物镜最后一个透镜的下表面与硅片之间来增加系统的数值孔径,可以将193nm光刻延伸到45nm节点以下。阐述了浸没式光刻技术的原理,讨论了液体浸没带来的问题,最后介绍了浸没式光刻机的研发进展。 相似文献